A fabric mask with Asian centella is intended for problematic sensitive skin prone to redness and post-acne spots. The active essence is enriched with components that help correct all visible imperfections and strengthen the protective functions of the skin to prevent their occurrence.

The mask not only refreshes and soothes the skin, but also provides the hydration and basic care it needs.

Directions for use: remove the mask from the packaging and place it on the surface of cleansed, toned skin. Straighten tightly, removing all formed creases and air bubbles and leave the mask for 15-20 minutes. Then remove the mask and apply the remaining essence from the package to the skin.